Negative Developer 500ML

Used for developing boards laminated with MG Chemicals 416 DFR-5 Negative Dry Film Resist. For removing exposed resist during the positive photofabrication process.

Developing Process:
Dilute 1 part of developer to 10 parts of room temperature water. Mix well with foam brush. Submerge exposed board into solution and brush the board gentle with foam brush. If double sided board, flip the board and to brush the other side and repeat until developing is completed. The developing process is completed once all the resist has been washed off leaving the image of your schematic on the board. Take the board out of the solution and then rinse with water. You are now ready for etching.

Specifications:

• Physical state: Liquid
• Odor: Odorless
• Appearance: Clear, Colorless solution
• PH: 13.10
• Flash point: Non-flammable
• Vapor pressure: Similar to water
• Solubility: Completely soluble
• Specific gravity: 1.08
• Volitile Organic Compounds (VOC): 0 g/l

View MSDS

View Negative Prototyping Process

 MG Chemicals RoHS Statement